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課程名稱 |
半導體檢測技術
Advanced Metrology for Semiconductor Manufacturing |
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開課學期 |
110-2 |
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授課對象 |
工學院 機械工程學系 |
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授課教師 |
傅尉恩 |
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課號 |
ME5051 |
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課程識別碼 |
522 U6260 |
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班次 |
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學分 |
3.0 |
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全/半年 |
半年 |
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必/選修 |
選修 |
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上課時間 |
星期四A,B,C(18:25~21:05) |
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上課地點 |
工綜205 |
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備註 |
總人數上限：30人 |
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課程簡介影片 |
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核心能力關聯 |
本課程尚未建立核心能力關連 |
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課程大綱
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課程概述 |
The feature sizes involved for advanced technology nodes in semiconductor manufacturing continue to plunge into nanoscale levels. The demands for more effective and accurate measurements both in-line and off-line in the processes with feature sizes below a few nanometers are urgent and critical. This course intends to deliver fundamental concepts and practical aspects of semiconductor metrology for those frequently used characterization tools in device fabrication to students. |
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課程目標 |
The following contents will be covered as:
-Nanoscale metrology and instrumentations
-FEOL Critical dimension measurements in Semiconductor Manufacturing
-Film thickness measurements: X-Ray Reflection (XRR), Spectroscopic
Ellipsometry (SE)
-Particle Metrology, Defects and Inspections
After completing the course the student should be able to:
-Describe fundamentals of measurement principles for nanometrology
-Evaluate the “metrology” for Critical Dimensions in front end processes
-Explain the inline inspections for nanoparticles
-Assess analytical methods for film thickness |
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課程要求 |
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預期每週課後學習時數 |
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Office Hours |
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指定閱讀 |
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參考書目 |
No textbook assigned, but selected readings can be found from the following books
Semiconductor and Nano Metrology Related:
Metrology and Diagnostic Techniques for Nanoelectronics, CRC Press, 2017, Zhiyong Ma
Semiconductor Nanotechnology Advances in Information and Energy Processing and Storage, Springer, 2018, Stephen M. Goodnick
3D Microelectronic Packaging From Fundamentals to Applications, Springer, 2017, Yan Li
Introduction to Metrology Applications in IC Manufacturing, SPIE, 2015, Bo Su, Eric Solecky, Alok Vaid
X-Ray Related:
X-Ray Metrology in Semiconductor Manufacturing, Taylor & Francis, 2006, D. Keith Bowen
Elements of modern X-ray physics, Jens Als-Nielsen, 2001, John Wiely and Sons
X-Ray Diffraction: In Crystals, Imperfect Crystals, and Amorphous Bodies (Dover Books on Physics), 1994, A Guinier
Methods of X-ray and Neutron Scattering in Polymer Science, Oxford University Press, 2000, R.-J. Roe
Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications, 2012, D. Attwood |
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評量方式
(僅供參考) |
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